dLibra Digital Library - Mroczyński, Robert; Beck, Romuald B.; Jakubowski, Andrzej; Ćwil, Michał; Konarski, Piotr; Hoffmann, Patrick; Schmeißer, Dieter, The influence of annealing (900◦C) of ultra-thin PECVD silicon oxynitride layers, Journal of Telecommunications and Information Technology, 2007, nr 3

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Mroczyński, Robert; Beck, Romuald B.; Jakubowski, Andrzej; Ćwil, Michał; Konarski, Piotr; Hoffmann, Patrick; Schmeißer, Dieter, The influence of annealing (900◦C) of ultra-thin PECVD silicon oxynitride layers, Journal of Telecommunications and Information Technology, 2007, nr 3

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