dLibra Digital Library - Bieniek, Tomasz; Beck, Romuald B.; Jakubowski, Andrzej; Głuszko, Grzegorz; Konarski, Piotr; Ćwil, Michał, Applying shallow nitrogen implantation from rf plasma for dual gate oxide technology, Journal of Telecommunications and Information Technology, 2007, nr 3

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Bieniek, Tomasz; Beck, Romuald B.; Jakubowski, Andrzej; Głuszko, Grzegorz; Konarski, Piotr; Ćwil, Michał, Applying shallow nitrogen implantation from rf plasma for dual gate oxide technology, Journal of Telecommunications and Information Technology, 2007, nr 3

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